AMAT 0010-00017 Precision Semiconductor Process Interface

AMAT 0010-00017 Precision Semiconductor Process Interface

The AMAT 0010-00017 is a high-performance industrial component manufactured by Applied Materials, specifically engineered for use in vacuum-sealed semiconductor manufacturing environments.

This part serves as a critical interface within the process chamber, facilitating the transition between gas delivery systems and the wafer reaction zone.

Technical Parameter Table

Product Advantages and Features

Corrosion Resistance: Features specialized surface treatments that resist the aggressive chemistries found in Etch and CVD processes.

High Thermal Conductivity: Ensures uniform heat distribution across the assembly, preventing hot spots that can lead to process instability.

Vacuum Integrity: Machined to aerospace-grade tolerances to maintain hermetic seals, preventing atmospheric contamination in the chamber.

Reduced Particulate Shedding: Designed with smooth geometries to minimize dead zones where process byproducts could accumulate and later flake off onto wafers.

Application Cases

The 0010-00017 is widely utilized in sub-micron fabrication facilities (fabs) for the following:

Dielectric Etching: Maintaining precise gas flow paths during the removal of oxide layers.

Chemical Vapor Deposition (CVD): Assisting in the uniform deposition of thin films across 200mm and 300mm silicon wafers.

Plasma Cleaning: Durable enough to withstand high-frequency plasma cleaning cycles used to restore chamber hygiene.

Related Models & Same Series

The AMAT 0010 series encompasses various specialized hardware. Related components include:

0010-00018: Similar profile with adjusted flow orifice sizing.

0010-76123: High-temperature variant for specialized thermal processing.

0010-02155: Optimized for metal CVD configurations.

Installation and Maintenance

Maintenance Protocol: This component is critical to vacuum performance. Always handle with powder-free gloves to prevent oil transfer.

Preparation: Clean the mounting surface using electronics-grade IPA (Isopropyl Alcohol).

Seal Inspection: Always replace the associated O-rings when installing a new 0010-00017 to ensure a leak-free fit.

Alignment: Align the indexing pins (if applicable) with the chamber manifold to prevent cross-threading of mounting bolts.

Calibration: Post-installation, perform a standard “Leak Rate Test” to verify chamber vacuum integrity before resuming production.

Unique Product Description

The AMAT 0010-00017 is more than just a metal fabrication; it is a foundational element of the semiconductor “heart.”

By providing a stable, clean, and reliable interface within the Applied Materials ecosystem,

it allows fabs to maintain the high uptime and yield rates required in the modern chip-making industry.

This component is optimized for the rigorous cycles of high-volume manufacturing, offering a seamless fit for legacy and modern platforms alike.