AMAT 0090-76109 RF Matching / Capacitor Assembly
AMAT 0090-76109 is a high-performance precision component manufactured by Applied Materials (AMAT).
It is a specialized RF (Radio Frequency) Match Network or Capacitor Assembly component, primarily utilized in the power delivery systems of semiconductor processing tools like the Centura, Endura, and Producer platforms.
Introduction
The AMAT 0090-76109 plays a critical role in plasma-enhanced semiconductor processes.
In systems such as PECVD (Plasma Enhanced Chemical Vapor Deposition) or Etch, the delivery of RF power must be perfectly matched to the impedance of the plasma chamber to ensure stable ion bombardment and film uniformity.
This component is engineered to handle high-voltage RF signals, providing the necessary capacitance or tuning stability required to maintain a consistent plasma discharge during wafer processing.
Technical Parameter Table
The following specifications define the operational profile for the 0090-76109 RF component:
| Feature | Specification |
| Manufacturer | Applied Materials (AMAT) |
| Part Number | 0090-76109 |
| Component Type | RF Matching / Capacitor Assembly |
| Material Construction | High-Purity Ceramic / Silver-Plated Copper |
| Cooling Method | Convection / Heat Sink Compatible |
| RF Frequency Range | Typically 13.56 MHz (Standard Industrial RF) |
| Voltage Rating | High-Voltage RF Optimized |
| System Compatibility | Producer, Centura, and Endura Platforms |
Related Models
The 0090-76109 is often integrated within broader RF delivery systems alongside:
AMAT 0010-XXXXX: RF Match Box Assemblies.
AMAT 0190-XXXXX: RF Generators and Power Supplies.
AMAT 0040-XXXXX: Pedestal and Cathode assemblies that receive the RF signal.
Application Cases
Plasma Etching: Ensuring precise power delivery to the plasma for uniform removal of material across 300mm wafers.
Dielectric Deposition: Stabilizing the RF field during the growth of insulating layers to prevent film defects or “arcing.”
RF Match Tuning: Used as a replacement part during the refurbishment of automated match networks (AMNs) to restore tuning speed and accuracy.
Product Advantages and Features
Low Loss Tangent: Constructed with high-grade dielectric materials to minimize power dissipation and heat generation.
Extreme Stability: Engineered to maintain constant capacitance values even under the thermal stress of continuous 24/7 Fab operations.
Precision RF Shielding: Designed to minimize EMI (Electromagnetic Interference) with surrounding sensitive control electronics.
OEM Reliability: As a genuine Applied Materials part, it ensures the “Phase and Magnitude” of the RF signal remain within the tight tolerances required by the tool’s software.
Other Models in the Same Series
AMAT 0090-76108: (Lower capacitance variant)
AMAT 0090-76110: (High-power configuration)
AMAT 0090-05124: (Legacy RF matching component)
| Vibro meter | IOCN 200-566-000-113 |
| VIBRO METER | VM600 MPC4 200-510-111-034 200-510-070-113 |
| Vibro-meter | VM600 CMC16 |
| Vibro-meter | VM600 RPS6U |
| Vibro-Meter | 444-680-000-511 |
| Vibro-meter | VM600-ABE040 204-040-100-011 |
| Vibro-meter | 600-003 620-001-001-116 VM600 XMV16 |
| Vibro-meter | 620-002-000-113 620-003-111-112 VM600 XI016T |
| Vibro-meter | 200-560-000-018 200-560-101-015 VM600 IOC4T |
| Vibro-meter | 620-002-000-113 620-003-111-112 VM600 XIO16T |
| Vibro-meter | VM600 RLC16 |
Installation and Maintenance
Safety Warning: RF components can retain significant residual charge. Ensure all RF generators are locked out and tagged out (LOTO) before service.
Cleanliness: Hand oils can cause “hot spots” on RF components. Always use clean, lint-free gloves during installation.
Torque Specs: Ensure all RF strap connections are tight. Loose connections in an RF path can lead to localized heating, arcing, and catastrophic failure of the match box.
Calibration: After replacement, a “Match Tune” calibration should be performed via the tool interface to ensure the automated tuning range is centered.
Unique Product Description
The AMAT 0090-76109 is the “tuning fork” of the plasma chamber. In the high-stakes world of sub-10nm logic and memory manufacturing, the ability to strike and maintain a perfect plasma is the difference between a functional chip and a wasted wafer.
This component provides the electrical precision necessary to bridge the gap between the RF generator and the process environment
For maintenance engineers looking to eliminate “Reflected Power” issues and improve “Time to Tune,” the 0090-76109 is a critical asset for maintaining peak tool performance.